SANTA CLARA, Calif.--(BUSINESS WIRE)--Spintrac Systems, Inc., a Silicon Valley-based manufacturer of photoresist spin coater and developer systems, has received a repeat order from a key U.S. customer ...
The semiconductor industry is rethinking the manufacturing flow for extreme ultraviolet (EUV) lithography in an effort to improve the overall process and reduce waste in the fab. Vendors currently are ...
Dr. Thomas Glinsner, head of product management for EV Group, noted, “Our new EVG120 system reflects EVG's 15 years of experience in resist coating and developing, and our unique process skills. In ...
The device processing for the double-clamped GaN bridge resonator on Si substrate: (1) The as-grown GaN epitaxial film on Si substrate. Except for the AlN buffer layer, no strain removal layer is used ...
“Close collaboration with our customers made it clear that the next logical step for our coater/developer technology was to create a universal approach for high-volume processing of devices with more ...
CHICAGO, July 3, 2023 /PRNewswire/ -- The report "Photoresist & Photoresist Ancillaries Market by Photoresist Type (ArF Immersion, ArF Dry Film, KrF, G-line & I-line), Ancillary Type (Anti-reflective ...
(Nanowerk News) Researchers at the University of New Mexico have demonstrated a new, simple, and facile approach to the fabrication of various nanopatterned films composed of nanoparticles. The ...
(Nanowerk Spotlight) Perovskite materials have attracted great attention in the fields of optoelectronics due to their significant optoelectronic properties. So far, the applications of perovskite ...
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