Customers and ecosystem partners are expanding use of the Calibre® Pattern Matching solution to overcome complex integrated circuit (IC) verification and manufacturing problems. The solution ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

As the complexity of IC designs continues to grow, moving critical checks earlier in the design cycle helps designers identify and resolve issues before they escalate, streamlining the overall ...

Trust is generally a reflection of quality. You trust someone, be it an individual or a company, because they have, over time, consistently performed high-quality work. You trust a product because ...

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...

As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...